Refractive projection objective

ABSTRACT

Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8&lt;D 1 /D 2 &lt;1.1.

This application is a continuation-in-part application of international patent application PCT/US03/06592, filed on Mar. 3, 2003 and claiming priority of US provisional application 60/360,845 filed on Mar. 1, 2002, which international application was published in English as WO 03/075049 A2 on Sep. 12, 2003. The complete disclosure of the international patent application is incorporated into this application by reference. Benefit is claimed from provisional application U.S. 60/360,845 filed on Mar. 1, 2002. International patent application PCT/US03/06592 is based on international patent application PCT/EP03/01147 filed on Feb. 6, 2003, claiming priority of US 60/360,845 filed on Mar. 1, 2002 and published in German as WO 03/075096 A2 on Sep. 12, 2003. The complete disclosure of this latter international patent application is also incorporated into this application by reference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The invention relates to a refractive projection objective for microlithography, which consists, in the direction of light propagation, of a first convexity, a waist, and a second convexity. Such refractive projection objectives are also termed “single-waist” systems

2. Description of the Related Art

Such single-waist systems are known, for example, from U.S. 60/160799, EP 1 061 396 A2, and from EP 1 139 138 A1 or WO 01/23933-WO 01/23935. It is already known from these documents that the first or the first two object-side lenses have negative refractive power. Furthermore it is known from these documents that the imaging quality can be increased by the use of aspherics. Since the resolution attainable with a projection objective increases in proportion to the image-side numerical aperture of the projection objective, and furthermore in proportion to the reciprocal of the exposure wavelength, the endeavor is predominantly to provide projection objectives with the greatest possible numerical aperture in order to increase the resolution.

U.S. Pat. No. 6,560,031 shows another refractive projection objective having one waist and a first, object-side lens having negative refractive power, wherein at least one lens which is arranged between the object plane and the waist comprises an aspherical surface.

International patent application PCT/E 02/04846 filed on May 3, 2002 by the applicant and claiming priority of DE 102 10 899.4 filed on Mar. 8, 2002 shows other single-waist systems allowing very high image-side numerical apertures NA≧0.85, where values of NA≧1 can be obtained e.g. if used in conjunction with an immersion liquid.

US patent application US 2004/0120051 A1 based on international patent application PCT/EP03/01651 filed on Feb. 9, 2003 and claiming priority of provisional application 60/360,845 filed on Mar. 1, 2002 shows another refractive projection objective having one defined waist and negative lenses on the object-side entry.

International patent application PCT/EP03/01954 filed on Feb. 26, 2003 and claiming priority of DE 102 10 899.4 filed on Mar. 8, 2002 and corresponding to U.S. patent application Ser. No. 10/379,809 filed on Mar. 6, 2003 shows refractive projection objectives for immersion lithography designed as single-waist systems.

US patent application US 2004/0004757 A1 filed on May 5, 2003 and claiming priority of PCT/EP02/04846 filed on May 3, 2002 and DE 102 24 361 filed on May 24, 2002 discloses very-high aperture projection objectives designed as single-waist systems having a belly (or convexity) near the object, a belly near the image and a waist defined therebetween, where a negative group which has an effective curvature with a concave side directed towards the image is arranged in a region of divergent radiation between the waist and the system diaphragm arranged in the belly near the image. The disclosure of this document is incorporated herein by reference.

It is furthermore necessary, with the requirements set on a projection objective in microlithography, to use selected materials of high quality. Fluoride materials are in particular only available to a limited extent at present in the required quality. For example, at an exposure wavelength of 193 nm, a few lenses of calcium fluoride are used for compensation of chromatic aberration in projection objectives designed for this wavelength. Furthermore, calcium fluoride lenses, which are not so sensitive as regards compaction, are preferably used close in front of the wafer.

SUMMARY OF THE INVENTION

It is one object of the invention to provide a refractive projection objective which, with a high numerical aperture, has reduced production costs due to a reduced use of material. It is another object of the invention to provide a refractive projection objective which has an image side numerical aperture NA>0.7, a good correction of image aberrations and a small number of lenses. It is another object of the invention to provide a refractive projection objective which has an image side numerical aperture NA>0.7, a good colour correction and which can be manufactured from lenses made from one material only.

To address these and other objects the invention, according to one formulation of the invention, a refractive projection objective for microlithography with a numerical aperture NA greater than 0.7 is provided, consisting of:

-   -   a first lens group immediately following an object plane of the         projection objective and having negative refractive power;     -   a second lens group immediately following the first lens group         and having positive refractive power;     -   a third lens group immediately following the third lens group         and having negative refractive power for generating a         constriction of a light beam passing through the projection         objective;     -   a fourth lens group immediately following the third lens group         and having positive refractive power; and     -   a fifth lens group immediately following the fourth lens group         and having positive refractive power;     -   the projection objective thereby consisting of a first         convexity, a second convexity, and a waist arranged between the         first and second convexity, wherein the first convexity has a         maximum diameter denoted by D1, and the second convexity has a         maximum diameter denoted by D2, and wherein 0.8<D₁/D₂<1.1.

Reducing the maximum diameter of the second convexity was found particularly advantageous in the context of the above objects.

An arrangement of diverging lenses in the entry region of the objective, particularly of three negative lenses, contribute to the shortening of the projection objective, which advantageously affects the space requirement needed for the projection objective in the projection exposure device. Furthermore, a shortening of the projection objective also implies a reduction of the lenses used, so that the material used and the production costs can be reduced.

It has been found to be advantageous, for the compensation of spherical aberrations of higher order which are produced by a high numerical aperture in the end region of the projection objective, to provide strongly curved meniscuses which have negative refractive power and which are arranged between the narrowest constriction in the waist and the diaphragm and directly after the diaphragm.

It has been found to be advantageous that these meniscuses have a convex surface on the side turned toward the object.

According to another formulation it has been found advantageous in a projection objective which is designed as a purely refractive single-waist system with a belly (convexity) near the object, a belly (convexity) near the image and a waist therebetween, to arrange in a region of divergent radiation between the waist and the system diaphragm a negative group which has an effective curvature with a concave side directed towards the image. The negative group may be particularly beneficial in combination with a negative meniscus lens having an image side concave surface and arranged immediately behind the diaphragm. An object side negative meniscus of the negative group may be beneficial in combination with a meniscus lens having an image side convex surface immediately ahead. This meniscus lens may be a positive lens.

A “negative group” in this sense is a lens group with an overall negative refractive power, the lens group being able to comprise one or more lenses. The negative group is bent as a whole relative to the beam path as a result of the effective curvature. This curvature can be characterized by a surface of curvature whose centre of curvature is situated on the image side. The effective curvature of the lens (or of the surface of curvature) is characterized by a radius of curvature r_(c) which is calculated as follows for a lens whose entry surface has the radius r₁ and whose exit surface has the radius r₂: 1/r _(c)=1/(2*r ₁)+1/(2*r ₂)   (1)

If the negative group comprises two or more lenses, the effective curvature of the group is calculated as follows: 1/r _(c)=1/(n*r ₁)+1/(n*r ₂)+1/(n*r ₃)+1/(i n*r₄)+   (2) n specifying the number of surfaces.

Together with the divergence of the radiation in the region of the lenses, the effective curvature concave towards the image has the effect that high incidence angles occur particularly on the exit sides of the one or more lenses of the negative group. These are very effective above all for correcting aberrations of high order, in particular for aperture-dependent correction, (which act to overcorrect) of monochromatic aberrations in the image field zone and edge of the image field. Here, the negative group can create at least partially corrective functions such as would be possible otherwise only by providing a further waist.

In a development, the negative group comprises at least one lens with negative refractive power and a concave surface directed towards the image. By splitting, the negative refractive power can also be distributed over a plurality of such, consecutive lenses of negative refractive power, the centers of curvature for the image-side exit surfaces being situated in each case on the image side. Here, a particularly material-saving, compact design is possible in the case of the use of only one or two such lenses of negative refractive power. If two lenses are lined up, it is advantageous when the refractive power of the first, object-side lens is greater than that of the subsequent, image-side lens of the group. These negative lenses can be configured as negative meniscus lenses.

It has been found to be advantageous to provide two meniscuses between the narrowest constriction of the light beam in the waist and the diaphragm, with their convex lens surfaces turned toward each other.

It has furthermore been found to be advantageous to provide a free region in the second convexity, for the arrangement of a system diaphragm. It is possible, by providing this free region, to provide a diaphragm which is axially displaceable.

Furthermore, with a constructional space of this kind available for the arrangement of the diaphragm, the use of curved diaphragms is also provided for without problems.

It has been found to be advantageous to specifically select the lens surfaces provided so that the entry and exit angle of the ray falling on the lens, or the radiation leaving the lenses, is smaller than 60°. This measure has a particularly advantageous effect on the usable coatings of the lenses, or simpler coatings can be provided as antireflection coating, since the effectiveness of such coatings as an antireflection coating depends in particular on the angle of incidence of the incident radiation.

However, it was found that with high (image-side) numerical apertures beyond 0.7, such incident or exit angles at the refractive elements, namely lenses and cover plate (next to the image plane), in excess of 60 degrees are unavoidable. Now it was found that imaging errors produced by this can be advantageously compensated by some refractive elements within the objective, which have maximum incident or exit angles of just as high values exceeding 60 degrees. Preferred locations for these elements are given. Additionally, few elements having angles between 50 to 60 degrees are useful.

Further advantageous measures are described in further claims.

The invention is explained in detail using the following embodiment examples. These embodiment examples are not to be considered as limiting.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 shows a projection exposure device;

FIG. 2 shows a projection objective for the wavelength 193 nm;

FIG. 3 shows a projection objective for the exposure wavelength 193 nm;

FIG. 4 shows a projection objective for the wavelength 193 nm;

FIG. 5 shows a projection objective for the exposure wavelength 157 nm;

FIG. 6 shows a projection objective for the wavelength 193 nm;

FIG. 7 shows a projection objective for the exposure wavelength 193 nm;

FIG. 8 shows a projection objective for the wavelength 193 nm;

FIG. 9 shows a projection objective for the exposure wavelength 193 nm.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

The principal construction of a projection exposure device 101 for microlithography is first described using FIG. 1. The projection exposure device 101 has an illuminating device 103 and a projection objective 105. The projection objective 105 includes a lens arrangement 121 with an aperture diaphragm 119, an optical axis 107 being defined by the lens arrangement 121.

A mask 109, held by a mask holder 111 in the beam path, is arranged between the illuminating device 103 and the projection objective 105. Such masks 109 used in microlithography have a micrometer to nanometer structure which is imaged with a reduction by a factor of up to 10, in particular by a factor of 4, by the projection objective 105 or respectively by the lens arrangement 121, on an image plane 113. A substrate or respectively a wafer 115 is held positioned by a substrate holder 117 in the image plane 113. The minimum structures which can still be resolved depend on the wavelength of the light used for the exposure and also on the aperture of the projection objective 115, the maximum attainable resolution of the projection exposure device increasing with decreasing wavelength and increasing image-side numerical aperture of the projection objective 105.

Possible lens arrangements 121 of the projection objective 105 are shown in detail in FIGS. 2-8. The lens arrangements 121 shown, which can also be termed designs, have an image-side numerical aperture of 0.85 or 0.9. The designs shown in FIGS. 2-4 and 6-8 are designed for the exposure wavelength of 193 nm. The projection objective shown in FIG. 5 is designed for the exposure wavelength of 157 nm. It is common to all these designs that the aberrations which arise are very small and thus structure widths down to 70 nm can be resolved. Here on the one hand the wavefront error is less than 5/1,000 of the wavelength of the light used for exposure, and on the other hand the distortion is smaller than 1 nm. The longitudinal chromatic error is smaller than 380 nm/pm. The large field size of 26×10.5 mm², in which the imaging is highly corrected in this fashion, makes productive use possible in microlithography. These projection objectives with such lens arrangements are especially suitable for use in lithographic scanning devices, because of the configuration of the field size or respectively of the field format.

Before going into the excellent optical properties of the lens arrangements 121 shown in FIGS. 2-9, the principal structure of these lens arrangements 121 will first be described in detail. In the propagation direction of the light beam, the lens arrangements 121 have a first convexity 123, a waist 125, and a second convexity 127. The waist 125 includes a place of narrowest constriction 129. A system diaphragm 119 is arranged in the second convexity.

These lens arrangements may also be divided into five lens groups LG1-LG5. The first lens group LG1 includes-three negative lenses with the lens surfaces 2-7. The first two negative lenses are preferably curved toward the object. The third negative lens is preferably a meniscus lens which is curved toward the image. The second lens group LG2 adjoins this first lens group, and has positive refractive power, the lens of maximum diameter of the first convexity being arranged in this second lens group. This second lens group LG2 preferably includes exclusively lenses of positive refractive power.

The third lens group LG3 adjoins this lens group LG2 and has negative refractive power. This third lens group LG3 includes at least three successive lenses of negative refractive power. A fourth lens group LG4 adjoins this third lens group LG3 and has positive refractive power. This fourth lens group LG4 ends before the diaphragm.

A fifth lens group LG5 is formed by the lenses arranged after the system diaphragm 119, and likewise has positive refractive power. This fifth lens group LG5 includes a lens of maximum diameter in the second convexity, this diameter being denoted by D2.

All of these examples are distinguished by an excellent correction of the wavefront. The image errors which arise are corrected to values smaller than 5/1,000 of the wavelength. The principal ray distortion is connected to values smaller than 1 nm.

The advantageous effect of the present distribution of refractive power is amplified by the use of aspherics. The two aspherics on the diverging lenses in the first lens group LG1 serve principally for correction of the distortion and the object-side and image-side telecentricity of the principal rays of the outermost field point.

The third lens group LG3 begins with a weakly diverging meniscus lens, whose convex side is arranged turned toward the mask 109. This meniscus is followed by a lens with positive refractive power and at least two strongly diverging biconcave lenses. If aspherics are provided in this second lens group LG2, these are arranged on a concave surface turned toward the wafer. For the correction of higher terms of the aperture aberration and of the coma, at least one aspheric is arranged in each of the lens groups LG4 and LG5, or respectively before and after the diaphragm in the neighborhood of the greatest diameter of the second convexity. At least one diverging meniscus is arranged between the waist and the diaphragm, and thus in the fourth lens group LG4. In the preferred embodiments, FIGS. 2 and 3, this has a concave surface turned toward the wafer and hence a similar shape to the diverging meniscus following directly behind the diaphragm.

The state of correction is shown in FIGS. 2 a-2 c through FIGS. 7 a-7 c for each example, using curves of the spherical aberration, and of astigmatism, and the characteristics for the RMS value of the wavefront. The RMS values, which correspond to the mean square wavefront deformation, may be determined as follows: W _(RMS)={square root}{square root over ((<W ² >−<W> ²))} with W as wavefront error and the acute parentheses as operand for the formation of the mean value.

The longitudinal chromatic error CHL, which is determined as follows: ${CHL} = \frac{{s^{\prime}\left( \lambda_{1} \right)} - {s^{\prime}\left( \lambda_{2} \right)}}{\lambda_{1} - \lambda_{2}}$ is given in Table 1 (attached). Here s′ is the paraxial image width after the last surface and λ₁ and λ₂ are reference wavelengths. CHL is given in nm per pm.

The choice of a single-waist system has an advantageous effect on the appearance of chromatic errors, which are- usually corrected, as for example in WO 01/23935, by the use of at least two materials, for example, by SiO₂ and CaF₂ at a wavelength of 193 nm.

In contrast to this, in the embodiment examples shown in FIGS. 2-9, the use of only one material is provided, wherein outstanding image quality as regards chromatic aberrations could be attained precisely by the arrangement of the meniscuses provided after the position of the narrowest constriction. This image quality is distinguished by a longitudinal chromatic aberration or “axial color” smaller than 385 nm per pm. The color magnification aberration or “lateral color” is smaller than 0.8 ppm/pm, which represents an outstanding value. This corresponds to a color magnification aberration of 11 nm/pm at the image edge. (ppm stands for parts per million).

The use of a possible additional, second material can be provided for the correction of chromatic aberration and/or at places where a high energy density appears, to avoid compaction and rarefaction effects. Compaction and rarefaction effects mean here, changes of refractive index, depending on the material, in regions of high energy density.

The excellent image quality as regards chromatic aberration is supported by the shapes of the two convexities. The ratio of the maximum diameter of the first convexity, D1 and of the second convexity, D2, satisfies the following conditions: 0.8<D1/D2<1.1.

Preferably, 0.8<D1/D2<1.0.

In the present examples, all the lens arrangements 121 have a numerical aperture of at least 0.85. However, it is of course possible to use this special arrangement in a lens arrangement which has a smaller image-side numerical aperture, in order to provide a larger field with unreduced image quality, or to further improve the image quality over the qualities shown using the embodiment examples, or to be able to reduce the use of aspherics. The designs are distinguished by small ray deflections or ray angle at most surfaces, in spite of high numerical aperture. Only small image aberrations of higher order are thereby generated.

Since the high angle of incidence in the neighborhood of the wafer on the lenses and the plane-parallel closure plate is unavoidable, aberrations of higher order are inevitably generated. In order to compensate these aberrations of higher order, few surfaces in the system are provided at which the incident radiation, or the radiation exiting from the lens, has a large angle of incidence or angle of refraction, which by choice of the sign opposes an aberration of higher order. In the examples, the strongly curved meniscuses are provided which have negative refractive power and which are arranged in the fourth and fifth lens groups. However, most of the lenses, at least 80% of all the lenses, have lens surfaces on which the entering light has an angle of incidence of less than 60°. The same holds for the lens surfaces at which the radiation exits again.

The possibilities of optimum coating of the lenses are thereby simplified, or respectively a back-reflection at the lens surfaces can be further reduced, since the effectiveness of such coatings depends strongly on the angle of incidence and as a rule decreases with increasing angle of incidence. It is not possible with a homogeneous layer system to obtain constant transmission over the whole surface and the full spectrum of the angle of incidence on the lens. Particularly in the transition zone of the angle region between 50° and 60°, the transmission worsens considerably with the same coating. It is therefore advantageous, firstly, to keep the angle of incidence in general as small as possible, and secondly, when large angles of incidence cannot be avoided for correction reasons, to position the lenses with the maximum angle of incidence in the neighborhood of the diaphragm. In this case, specific spectra of angle of incidence occur only in defined annular zones of the lens. In order to attain an optimum result as regards transmission, the coatings are varied in dependence on the radius, and thus are optimally matched to the respective region of angle of incidence.

These effects and advantages are shown here with purely refractive projection objectives, but in no way are limited to such, but as well apply to catadioptric projection objectives for microlithography, namely such with an image side refractive partial objective.

For the third embodiment according to FIG. 3, and Table 3, Table 3a gives the maximum incidence/exit angle measured in the optically thin medium (gas) Imax in degrees for each surface as in Table 3, plus the sine of the angle SINImax, which is directly comparable to the NA value. While the entrance and exit surface 49, 50 of the plane-parallel cover plate necessarily exceed Imax of 60 degrees with Imax=60, 70 degrees and the exit Imax of the last lens 47, 48 very nearly reaches the limit with Imax (48)=59.99 degrees. Here, exactly one lens surface 31 exceeds the limit, too, with Imax=60.51 degrees.

It is a negative meniscus lens situated between the object plane O and the system aperture 36, with the concave imageward surface 31 showing this extreme exit angle Imax=60.51 degrees, all this being preferred properties either singularly or in combination.

The fourth embodiment according to FIG. 4 and Table 4 has similar Imax properties shown in Table 4a. Cover plate 57, 58 closing the projection objective from the atmosphere at the image plane 60, where a wafer to be exposed is located, necessarily has an lmax=62 degrees, SIN Imax=0.88 equivalent to the (image side) numerical aperture NA. The exit surface 56 of the next lens 55, 56 also has an Imax (56)=61.28 degrees and also incident surface 53 of the third refractive element from the image plane has an Imax (53)=52.60 degrees exceeding 50 degrees.

Now, for compensation, it is provided by optical design choice, that also surfaces 33 and 34 in the lens arrangement between object plane 0 and system aperture 40 have Imax (33)=64.50 degrees and Imax (34)=61.22 degrees. Neighboring surfaces repeatedly lend themselves to this use of high Imax angles. Additional compensation is obtained by surfaces having Imax in the range between 50 degrees and 60 degrees. Neighboring surfaces 42 and 43 on two of the four lenses located next to the system aperture 40 have Imax (42)=57.28 degrees and Imax (43)=52.49 degrees. This is a preferred position for high Imax corrective elements.

Additionally, also in the first lens group LG1 neighboring surfaces 3 and 4 of the first and second lens show Imax (3)=59.47 degrees, almost=60 degrees, and Imax (4)=52.87 degrees, well in the additionally preferred 50 to 60 degree range.

The other incident angles are well kept down.

The sixth embodiment of FIG. 6, Table 6 and Table 6a shows Imax to exceed 60 degrees at the four surfaces of the two refractive elements next to the image plane 54, and specifically at surface 25 Imax (25)=65.26 degrees. This is situated at a location preferred by the inventors: between object plane 0 and aperture plane 37, on an image wise concave plane, thus being an exiting angle, and within negative lens group LG3, which consists of the four lenses next to the waist, which is effected by the locally minimum beam diameter (see data in sixth column of Table 6) at surface 23 of negative lenses 22, 23.

Additionally, surfaces 39 and 40 of lenses 38, 39 and 40, 41 show Imax (39)=58.11 degrees and Imax (40)=52.80 degrees as an assisting correction means with an Imax in the range from 50 degrees to 60 degrees. All the other surfaces within the object have well reduced Imax values, as normally preferable, with only surface 26 next to 25 reaching Imax (26)=45.11 degrees.

Besides, only the most imageward planar plates 50, 51 and 52, 53 show the Imax=61.15 degrees, necessitated by the required high incidence angle at the image plane (wafer plane) 54.

The seventh embodiment of FIG. 7, Tables 7 and 7a, is very similar with respect to Imax to the sixth embodiment.

The eighth embodiment of FIG. 8 and Tables 8, 8a has the highest (image side) numerical aperture NA=0.90, and therefore, poses the most stringent requirements of all aspects of lens design and construction.

The high NA value of 0.90 necessitates an angle of incidence at image/wafer plane 57 of Imax (57)=64.94 degrees, which inevitably is already given at the entrance and exit planes 55, 56 of the planar cover plate and at the planar exit plane 54 of the most imageward lens 53, 54.

Additionally, here, the concave entrance surface 51 of negative meniscus lens 51, 52 being the third refractive element from the image plane 57, shows Imax (51)=60.41 degrees and even exit surface 50 of the fourth refractive element 49, 50 from the image plane 57 has a value Imax (50)=54.37 degrees, above the 50 degree limit already having strong effects on reflection.

As a counter measure, according to the invention, negative meniscus lens 41, 42 second next to the system aperture 40 has an exit Imax (42)=61.53 degrees on the concave surface, and also negative meniscus lens 34, 35 situated between object plane 0 and system aperture 40 in lens group LG4 has an exit Imax (35)=63.97 degrees, counterbalancing the effects of the high angular load on the most imageward refractive elements at a preferred location.

An additional correcting high Imax is also provided on incident surface 38 of lens 38, 39 situated next to the system aperture 40, with an Imax (38)=54.37 degrees in the secondary preferred interval of 50 degrees −60 degrees. The two surfaces 42, 38 with high Imax so near to the system aperture are especially well suited for antireflective coatings with radially varying layers compensating towards uniform reflective suppression of different incident/exit angles, as here their distribution is to a high degree rotationally symmetric and radially increasing.

Also, in lens group LG3, surface 27 near the beam waist in this group has a corrective Imax (27)=50.21 degrees angle in a described, advantageous position.

Additionally, also in the first lens group, LG1, much as in embodiment 4, two neighboring surfaces 5, 6 show Imax (5)=50.60 degrees and Imax (6)=51.40 degrees in the 50 degree −60 degree region.

Other lens surfaces show well limited Imax angles as classically preferred.

It is to be noted that all tables recite surfaces in their sequence from the object plane 0, and that the drawings, FIGS. 2-8, show these sequential numbers, where for sake of clarity essentially only every second one is enscribed, the others easily to be deduced.

In order to be able to provide the most varied diaphragm systems in the designs shown, a free region, denoted by L_(AP), is provided in the region of the diaphragm. Thereby diaphragms can be used which can be moved toward the image in dependence on requirements. The most varied diaphragms can also be used, and diaphragm mounts can be provided which already have a mechanism for displacing the diaphragm, since sufficient constructional space must be available for the provision of such a structure. The last two of the lenses arranged before the system diaphragm 119 have to contribute considerably to the possibility of providing the free space L_(AP).

A reduction of the required lens material could be attained by means of the small diameter D1 and D2 in the two convexities 123, 127, and the short constructional length 1,000-1,150 mm and the small number of lenses. A lens mass m of less than 55 kg could be attained in a few embodiment examples; see Table 1. The lenses in the lens arrangements shown in FIGS. 2-9 are in the range of 54-68 kg.

Systems with large numerical aperture tend to require especially large diameter in the second convexity 127 and a large constructional length OO′. The design of the transition between the waist and the second convexity is important for attaining the small convexity diameter and the manageable constructional length. Two converging meniscuses are used here, with their convex sides turned toward each other. Because of this arrangement, the maximum lens diameter, and thus in particular the mass of the lens blank required, can be kept small due to the design of the second convexity. In order to attain as small a mass as possible, the following relationship must be maintained: L·D _(max)/(NA·2 yb)<12,850 where L is the constructional length measured from reticle to wafer, NA the image-side numerical aperture, D_(MAX) the maximum diameter of the system, and is thus D1 or D2, and 2 yb is the diameter of the image field. It is particularly advantageous if the maximum diameter of the first convexity D1 is at most equal to the maximum diameter of the second convexity D2.

The data characterizing the respective lens arrangements 121 are given in the following Table 1 (attached). L_(geo) is the sum of the middle thicknesses of all the lenses of the objective. LV is a measure for the free constructional space around a system diaphragm, L_(AP) being the free distance from the last lens surface before the diaphragm as far as the first lens surface after the diaphragm. ${LV} = \frac{2 \cdot L_{AP} \cdot \left( \frac{L_{geo}}{L - L_{AP}} \right)}{L}$ L_(geo) is the sum over the middle thicknesses of all the lenses arranged in the objective and L is the distance from the image plane O′ to the object plane O.

The exact lens data of the lens arrangement shown in FIG. 2 can be gathered from Table 2 (attached).

The aspheric surfaces are described by the equation $\begin{matrix} {{P(h)} = {\frac{\delta \cdot h^{2}}{1 + \sqrt{1 - {\left( {1 - K} \right) \cdot \delta^{2} \cdot h^{2}}}} + {C_{1}h^{4}} + \ldots + {C_{n}h^{{2n} + 2}}}} & \quad & {\delta = {1/R}} \end{matrix}$ where P is the sagitta as a function of the radius h (height to the optical axis 7) with the aspheric constants K, C₁-C_(n) given in the Tables. R is the vertex radius given in the Tables.

In FIGS. 2 a-2 c, the distribution of the image errors over the image is shown. In FIG. 2 a, the spherical longitudinal aberration is shown, with the relative aperture on the vertical axis and the longitudinal aberration on the horizontal axis. The course of the astigmatism can be gathered from FIG. 2 b. The object height is plotted in the vertical axis and the defocusing (mm) on the horizontal axis. The distortion is shown in FIG. 2 c, the distortion in % on the horizontal axis being plotted against the object height on the vertical axis.

The exact lens data for the lens arrangement shown in FIG. 3 can be gathered from Table 3 and Table 3a (attached).

The spherical aberration, astigmatism and distortion are shown in FIGS. 3 a-3 c as already described for FIGS. 2 a-2 c.

The exact lens data for the lens arrangement shown in FIG. 4 can be gathered from Table 4 and Table 4a (attached).

The imaging quality as regards spherical aberration, astigmatism and distortion is shown in FIGS. 4 a-4 c.

The exact lens data for the lens arrangement shown in FIG. 5 can be gathered from Table 5 (attached).

The exact lens data for the lens arrangement shown in FIG. 6 can be gathered from Table 6 and Table 6a (attached). Similarly, for Tables 7 and 7a and 8 and 8a, attached.

The above description of the preferred embodiments has been given by way of example. The individual features may be implemented either alone or in combination as embodiments of the invention, or may be implemented in other fields of application. Further, they may represent advantageous embodiments that are protectable in their own right, for which protection is claimed in the application as filed or for which protection will be claimed during pendency of the application. From the disclosure given, those skilled in the art will not only understand the present invention and its attendant advantages, but will also find apparent various changes and modifications to the structures and methods disclosed. The applicant seeks, therefore, to cover all such changes and modifications as fall within the spirit and scope of the invention, as defined by the appended claims, and equivalents thereof. TABLE 1 NA D₁mm D₂mm L =00′ mm L_(AP)mm L_(geo)mm D₁/D₂ Field mm² Number of asph λin nm CHL nm/ pm m kg LV $\frac{{NA} \cdot L}{D_{MAX}}$ 0.85 258.7 275.3 1150 49.6 821.7 0.94 26 × 10.5 8 193 380.5 63 0.13 3.55 0.85 266.7 279.4 1150 52.1 810.6 0.95 26 × 10.5 8 193 384.9 63 0.14 3.50 0.85 199.5 235.8 999.8 12.5 688.5 0.85 22 × 6 8 157 529.5 57 0.04 3.6 0.85 260 264 1100 46.1 794.5 0.98 26 × 10.5 8 193 370 60 0.13 3.54 0.85 263.9 277.6 1098 6 728 0.95 26 × 10.5 6 193 396 54 0.016 3.36 0.85 263.9 277.8 1098 9 726 0.95 26 × 10.5 6 193 392 54 0.023 3.36 0.92 84.2 285 1107 18 777.2 1 26 × 10.5 9 1193 374 60 0.05 3.5

TABLE 2 REFRACTIVE ½ FREE SURFACE RADIUS THICKNESS GLASSES INDEX DIAMETER  0  0.000000000 32.000000000 L710 0.99998200 56.080  1  0.000000000 0.000000000 L710 0.99998200 63.104  2 727.642869160 10.000000000 SIO2HL 1.56028895 63.718  3   226.525323855AS 13.700039256 KE193 0.99971200 65.318  4 2211.534901544  10.867348809 SIO2HL 1.56028895 67.362  5   272.198328283AS 38.109427988 HE193 0.99971200 70.568  6 −110.268446226   53.110762192 SIO2HL 1.56028895 71.923  7 −150.645587119   1.027970654 HE193 0.99971200 97.325  8  −1859.686377061    35.612645698 SIO2HL 1.56028895 112.154  9 −785.737931706   1.605632266 HE193 0.99971200 120.907 10 −15567.860026603    41.231791248 SIO2HL 1.56028895 124.874 11 −255.699077104   1.000000000 HE193 0.99971200 126.787 12 1289.315128841  21.016190377 SIO2HL 1.56028895 129.339 13  −1288.131288834    1.000000000 HE193 0.99971200 129.365 14 260.564227287 51.423634995 SIO2HL 1.56028895 127.263 15 1730.695425203  13.188971653 HE193 0.99971200 122.159 16 176.011027540 55.000000000 SIO2HL 1.56028895 107.596 17 109.644556647 11.784016964 HE193 0.99971200 81.889 18 136.796552665 41.333702101 SIO2HL 1.56028895 81.527 19 127.780585003 23.051923975 HE193 0.99971200 68.904 20 2669.368605391  34.121643610 SIO2HL 1.56028895 68.053 21   355.264577081AS 30.898497897 HE193 0.99971200 62.218 22 −109.389008884   10.000000000 SIO2HL 1.56028895 61.017 23 249.223110659 27.598291596 HE193 0.99971200 66.233 24 −143.820224710   42.179010727 SIO2HL 1.56028895 67.085 25 −176.696299845   2.479524938 HE193 0.99971200 84.196 26    −475.210722340AS 19.825006874 SIO2HL 1.56028895 90.545 27 −224.363382582   1.042633596 HE193 0.99971200 93.106 28 308.609848426 16.000000000 SIO2HL 1.56028895 102.746 29 201.721667456 25.528839747 HE193 0.99971200 103.303 30   944.687071148AS 19.894794059 SIO2HL 1.56028895 104.495 31 366.820570030 8.208658436 HE193 0.99971200 112.097 32 574.278724113 39.477814236 SIO2HL 1.56028895 113.555 33 −358.531323193   1.326991422 HE193 0.99971200 116.205 34   320.594715977AS 33.261672159 SIO2HL 1.56028895 129.696 35 1861.755729783  32.119103109 HE193 0.99971200 129.674 36  0.000000000 17.287410699 HE193 0.99971200 130.664 37 361.690129139 40.443225527 SIO2HL 1.56028895 137.657 38 232.801533112 17.100750060 HE193 0.99971200 134.775 39 343.521129222 43.749080263 SIO2HL 1.56028895 135.562 40  −1180.085155420    5.861047182 HE193 0.99971200 136.059 41 404.126406350 50.820935982 SIO2HL 1.56028895 137.263 42    −499.905302311AS 1.129115320 HE193 0.99971200 136.399 43 132.000000000 50.889776270 SIO2HL 1.56028895 108.737 44 207.781260330 1.875778948 HE193 0.99971200 96.990 45 131.976080166 50.620041025 SIO2HL 1.56028895 88.265 46 216.108478997 8.560819690 HE193 0.99971200 66.515 47   345.785473120AS 40.780402187 SIO2HL 1.56028895 62.290 48 803.014748992 2.855378377 HE193 0.99971200 37.054 49  0.000000000 10.000000000 SIO2HL 1.56028895 33.755 50  0.000000000 8.000000000 L710 0.99998200 27.205 51  0.000000000 0.000000000 1.00000000 14.020 ASPHERIC CONSTANTS: SURFACE NR. 3 K  0.0000 C1 −1.09559753e−007 C2  3.57696534e−012 C3  9.55681903e−017 C4  1.60627093e−020 C5 −2.38364411e−024 C6  9.48007957e−029 C7  6.17790835e−034 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 5 K  0.0000 C1 −3.98669984e−008 C2  1.21202773e−012 C3 −2.54482855e−016 C4  2.63372160e−020 C5 −7.20324194e−024 C6  1.11610638e−027 C7 −6.59707609e−032 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 21 K  0.0000 C1 −2.55118726e−008 C2 −2.20548948e−012 C3 −9.25235857e−017 C4 −3.33206057e−020 C5  6.94726983e−024 C6 −1.13902882e−027 C7 −1.90433265e−032 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 26 K  0.0000 C1 −2.59102407e−009 C2  7.80412785e−013 C3  6.46009507e−018 C4  9.48615754e−022 C5 −5.98580637e−026 C6 −6.85408327e−031 C7 −1.22088512e−035 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 30 K  0.0000 C1 −2.05499169e−009 C2 −9.59524174e−014 C3  3.47471870e−018 C4 −1.59033679e−023 C5  3.61312920e−027 C6  4.19166365e−031 C7 −6.21964399e−036 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 34 K  0.0000 C1 −5.41197196e−011 C2  2.68576256e−014 C3  1.97154224e−018 C4 −1.14136005e−023 C5 −6.50140227e−029 C6 −1.62666510e−032 C7  1.03803879e−037 C8  0.00000000e+000 C9  0.00000000e−000 SURFACE NR. 42 K  0.0000 C1  4.81397179e−010 C2 −9.43105453e−016 C3  2.24359599e−019 C4  4.36770636e−024 C5 −6.88569878e−028 C6  4.99976924e−033 C7 −3.38683104e−039 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 47 K  0.0000 C1 −3.38379388e−008 C2  1.92297513e−012 C3  3.68388126e−016 C4 −4.26261424e−020 C5 −7.93153105e−025 C6  5.33775440e−028 C7 −3.98605335e−032 C8  0.00000000e+000 C9  0.00000000e+000

TABLE 3 REFRACTIVE INDEX ½ FREE SURFACE RADIUS THICKNESS GLASSES 193.304 nm DIAMETER  0  0.000000000 32.000000000 L710 0.99998200 56.080  1  0.000000000 0.000000000 L710 0.99998200 63.102  2   225.350754363AS 10.000000000 SIO2HL 1.56028895 65.569  3 205.452906258 16.699011276 HE193 0.99971200 65.485  4    −485.968436889AS 10.000000000 SIO2HL 1.56028895 65.851  5 236.120586098 35.991435570 HE193 0.99971200 69.716  6 −118.383252950   35.248541973 SIO2HL 1.56028895 70.715  7 −199.283119032   1.000000000 HE193 0.99971200 91.711  8 −297.219107904   20.818099956 SIO2HL 1.56028895 96.216  9 −242.015290785   1.012986192 HE193 0.99971200 103.186 10  −8025.596542346    34.642805711 SIO2HL 1.56028895 115.500 11 −527.541918500   1.061404340 HE193 0.99971200 122.264 12 2846.863909159  47.490572144 SIO2HL 1.56028895 129.024 13 −281.527506472   1.000000000 HE193 0.99971200 131.520 14 720.498316615 25.197751101 SIO2HL 1.56028895 133.348 15  −1864.287720284    1.000000000 HE193 0.99971200 133.010 16 297.151930333 51.479599832 SIO2HL 1.56028895 129.235 17 2167.873564789  1.204618080 HE193 0.99971200 123.220 18 188.319913743 55.000000000 SIO2HL 1.56028895 111.397 19 108.153510038 15.971910183 HE193 0.99971200 83.783 20 148.002390368 55.000000000 SIO2HL 1.56028895 83.477 21 190.335908124 13.500103985 HE193 0.99971200 69.512 22 1443.253928436  24.323718717 SIO2HL 1.56028895 68.921 23   199.695044391AS 37.573461703 HE193 0.99971200 62.387 24 −111.551299373   10.000000000 SIO2HL 1.56028895 60.784 25 239.358614085 27.666487186 HE193 0.99971200 65.748 26 −142.880130573   41.866297159 SIO2HL 1.56028895 66.580 27 −189.902057474   1.589605652 HE193 0.99971200 84.173 28    −748.290216502AS 29.582545265 SIO2HL 1.56028895 90.858 29 −233.966894232   8.147720844 HE193 0.99971200 95.596 30 522.113109615 10.822356285 SIO2HL 1.56028895 105.238 31 222.998461180 27.042016978 HE193 0.99971200 107.333 32 2251.467600263  35.217263658 SIO2HL 1.56028895 108.549 33 −318.234735893   15.214352753 HE193 0.99971200 112.335 34 299.639863140 37.156335602 SIO2HL 1.56028895 130.529 35   1065.209248614AS 29.625427714 HE193 0.99971200 130.316 36  0.000000000 22.504097096 HE193 0.99971200 131.300 37 354.298294212 22.700275111 SIO2HL 1.56028895 139.703 38 238.221108961 17.302866825 HE193 0.99971200 137.684 39 350.361961049 48.201285092 SIO2HL 1.56028895 138.456 40    −830.182582275AS 8.553043233 HE193 0.99971200 138.929 41 451.152609432 53.706250069 SIO2HL 1.56028895 138.872 42 −529.782985076   2.080488115 HE193 0.99971200 137.286 43 131.667284180 50.882399067 SIO2HL 1.56028895 108.852 44 197.437143555 1.961444642 HE193 0.99971200 96.477 45 128.459992965 50.613576955 SIO2HL 1.56028895 87.931 46 248.183667913 8.856875224 HE193 0.99971200 67.641 47   466.791868973AS 40.667719468 SIO2HL 1.56028895 63.096 48 942.984808834 2.803249134 HE193 0.99971200 37.242 49  0.000000000 10.000000000 SIO2HL 1.56028895 33.823 50  0.000000000 8.020000000 L710 0.99998200 27.268 51  0.000000000 0.000000000 1.00000000 14.021 ASPHERIC CONSTANTS SURFACE NR. 2 K  0.0000 C1 9.00497722e−008 C2 −2.96761245e−012 C3  2.42426411e−016 C4 −1.29024008e−020 C5 −2.03172826e−024 C6  5.50185705e−028 C7 −3.89197744e−032 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 4 K  0.0000 C1  3.65969250e−008 C2 −1.92473151e−012 C3 −1.32665803e−016 C4  5.69164703e−021 C5  1.31041719e−024 C6 −1.53054324e−028 C7  9.97324868e−033 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 23 K  0.0000 C1 −1.27989150e−008 C2 −3.88749373e−012 C3 −2.51584504e−016 C4 −8.45723879e−021 C5 −7.11343179e−024 C6  1.64378151e−027 C7 −2.17615886e−031 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 28 K  0.0000 C1 −1.03153490e−008 C2  6.25910971e−013 C3  5.45981131e−018 C4  9.75498051e−022 C5 −1.22736867e−025 C6  1.17406737e−029 C7 −5.81094482e−034 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 35 K  0.0000 C1  5.28759000e−010 C2  1.51806496e−014 C3 −1.87647477e−018 C4 −1.08308029e−023 C5 −9.74605211e−028 C6  6.03242407e−032 C7 −5.09796873e−037 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 40 K  0.0000 C1  1.83813349e−010 C2  3.19321009e−015 C3  2.04249906e−019 C4  6.57531812e−024 C5 −2.09352644e−028 C6  1.60987553e−033 C7 −2.90466412e−037 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 47 K  0.0000 C1 −3.99800644e−008 C2  4.05930779e−012 C3  1.42362123e−016 C4 −3.12437665e−020 C5 −5.49454012e−024 C6  1.84641101e−027 C7 −1.54565739e−031 C8  0.00000000e+000 C9  0.00000000e+000

TABLE 3a Surface SINImax Imax [deg] 0 1 0.218 12.59 2 0.5596 34.03 3 0.488 29.21 4 0.3003 17.48 5 0.692 43.79 6 0.4085 24.11 7 0.2147 12.40 8 0.222 12.83 9 0.2023 11.67 10 0.459 27.32 11 0.1467 8.44 12 0.3916 23.05 13 0.4332 25.67 14 0.2266 13.10 15 0.22 12.71 16 0.3403 19.90 17 0.2733 15.86 18 0.2988 17.39 19 0.6767 42.59 20 0.4381 25.98 21 0.3087 17.98 22 0.3104 18.08 23 0.3781 22.22 24 0.6747 42.43 25 0.6352 39.43 26 0.2639 15.30 27 0.2167 12.52 28 0.4209 24.89 29 0.1783 10.27 30 0.521 31.40 31 0.8704 60.51 32 0.6151 37.96 33 0.0764 4.38 34 0.7263 46.58 35 0.2744 15.93 36 0.1613 9.28 37 0.5276 31.84 38 0.8146 54.55 39 0.682 43.00 40 0.2792 16.21 41 0.2977 17.32 42 0.6416 39.91 43 0.5727 34.94 44 0.2767 16.06 45 0.1175 6.75 46 0.7045 44.79 47 0.7818 51.43 48 0.8659 59.99 49 0.8721 60.70 50 0.8721 60.70 51 0.8721 60.70

TABLE 4 REFRACTIVE INDEX ½ FREE SURFACE RADIUS THICKNESS GLASSES 157.6 nm DIAMETER  0  0.000000000 29.091200000 N2 1.00000300 46.170  1  0.000000000 0.050360271 N2 1.00000300 52.536  2 −27403.121890329    6.400000000 CAF2HL 1.55848720 52.536  3 128.789046652 8.167826938 N2 1.00000300 55.162  4   464.481828994AS 6.543292509 CAF2HL 1.55848720 56.851  5 250.689303807 19.604013184 N2 1.00000300 58.208  6    −223.266447510AS 50.327605169 CAF2HL 1.55848720 59.504  7 −141.012345914   0.896857450 N2 1.00000300 77.821  8 −492.125790935   39.701273305 CAF2HL 1.55848720 84.708  9 −185.333140083   1.620061449 N2 1.00000300 91.930 10  −4917.002616489AS  36.075373094 CAF2HL 1.55848720 96.618 11 −224.975412381   17.499455417 N2 1.00000300 98.628 12 −249.735183706   31.779981213 CAF2HL 1.55848720 97.516 13 −169.147720350   1.273004772 N2 1.00000300 99.721 14 131.492053134 36.312876809 CAF2HL 1.55848720 83.706 15 1183.761281348  0.820000000 N2 1.00000300 79.822 16 446.400836562 6.793752445 CAF2HL 1.55848720 76.456 17  80.708201634 6.438487413 N2 1.00000300 62.135 18  88.076542641 28.609450919 CAF2HL 1.55848720 61.689 19 103.290384365 24.140118330 N2 1.00000300 53.717 20 −214.410142174   6.400000000 CAF2HL 1.55848720 52.881 21   166.705978193AS 25.336749078 N2 1.00000300 50.734 22  −86.759432429   6.718880984 CAF2HL 1.55848720 50.602 23 −895.255217870   20.208808365 N2 1.00000300 55.126 24  −94.182592644   7.167405034 CAF2HL 1.55848720 56.136 25 −199.256306511   6.787427649 N2 1.00000300 63.043 26 −257.348011065   42.358250101 CAF2HL 1.55848720 67.198 27 −158.070327885   0.915908375 N2 1.00000300 79.706 28 −536.887928001   21.844348944 CAF2HL 1.55848720 84.997 29 −205.950312449   2.162149307 N2 1.00000300 87.472 30  −1845.287959821AS  27.220459982 CAF2HL 1.55848720 90.588 31 −211.608710551   29.606451754 N2 1.00000300 91.877 32 −183.434679441   7.418912892 CAF2HL 1.55848720 90.562 33 240.988713790 8.623094130 N2 1.00000300 99.368 34 286.816486745 50.566486028 CAF2HL 1.55848720 104.285 35 −278.974234663   3.401812568 N2 1.00000300 106.263 36 272.985081433 35.883815357 CAF2HL 1.55848720 110.387 37  −1204.561658666AS  29.820606892 N2 1.00000300 109.520 38 −205.963439341   9.589085190 CAF2HL 1.55848720 108.972 39 −486.467956109   23.105163626 N2 1.00000300 111.820 40  0.000000000 −10.633177329 N2 1.00000300 113.000 41   520.246306609AS 6.400000000 CAF2HL 1.55848720 113.282 42 210.835739690 9.380949546 N2 1.00000300 113.819 43 249.610235127 72.661056858 CAF2HL 1.55848720 116.283 44 −368.944153695   27.617582877 N2 1.00000300 118.001 45   194.602406707AS 40.994994726 CAF2HL 1.55848720 111.496 46 2325.171902613  0.959912478 N2 1.00000300 108.992 47 120.131289340 32.489921154 CAF2HL 1.55848720 91.646 48 219.061234205 4.330384877 N2 1.00000300 86.556 49 148.308513415 23.818571196 CAF2HL 1.55848720 79.114 50 203.105155430 0.826871809 N2 1.00000300 69.446 51 136.769195322 19.729069306 CAF2HL 1.55848720 64.538 52 210.657871509 6.502120434 N2 1.00000300 55.515 53 376.287223054 15.336785456 CAF2HL 1.55848720 51.778 54 183.572236231 4.060877180 N2 1.00000300 40.084 55 181.243374040 16.948210271 CAF2HL 1.55848720 36.115 56 426.075165306 1.398093981 N2 1.00000300 26.107 57  0.000000000 2.400024000 CAF2HL 1.55848720 25.121 58  0.000000000 7.272800000 N2 1.00000300 23.545 59  0.000000000 0.000000000 N2 1.00000300 11.543 60  0.000000000 0.000000000 1.00000000 11.543 ASPHERIC CONSTANTS SURFACE NR. 4 K  0.0000 C1  3.68947301e−007 C2 −2.07010320e−011 C3  1.80448893e−015 C4 −2.02024724e−019 C5  1.06591750e−023 C6  8.66812157e−027 C7 −1.28036020e−030 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 6 K  0.0000 C1 −1.90456699e−007 C2  7.09276542e−012 C3 −9.42039479e−016 C4  9.60030375e−020 C5 −4.81313543e−023 C6  1.26016542e−026 C7 −2.12906900e−030 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 10 K  0.0000 C1  1.24881874e−009 C2 −7.54632592e−013 C3  9.59548418e−018 C4  3.61424148e−022 C5  4.66204361e−026 C6 −5.18069760e−030 C7  6.76055535e−035 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 21 K  0.0000 C1 −1.78468549e−007 C2 −5.04642691e−012 C3 −9.31857452e−016 C4  2.41285214e−019 C5 −1.68512636e−022 C6  5.20287108e−026 C7 −7.17032999e−030 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 30 K  0.0000 C1 −1.34161725e−008 C2  8.16970893e−014 C3 −3.14061744e−018 C4  1.03237892e−021 C5 −1.84717130e−025 C6  1.87170281e−029 C7 −7.93751880e−034 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 37 K  0.0000 C1  7.99945890e−009 C2 −1.42636834e−013 C3 −2.69989142e−019 C4 −5.15246689e−023 C5 −4.83470243e−027 C6  2.58478622e−031 C7 −7.74164486e−036 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 41 K  0.0000 C1 −4.43364674e−009 C2  1.10741132e−014 C3  3.55153523e−018 C4 −4.85210428e−024 C5  2.35336826e−027 C6 −1.03253172e−031 C7  4.79327883e−036 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 45 K  0.0000 C1 −1.18399241e−009 C2 −1.58492270e−013 C3 −1.27975554e−018 C4 −1.10519991e−022 C5  2.24373710e−027 C6 −9.77335519e−032 C7 −5.74659204e−036 C8  0.00000000e+000 C9  0.00000000e+000

TABLE 4a surface SINImax Imax [deg] 0 1 0.218 12.59 2 0.2161 12.48 3 0.8614 59.47 4 0.7973 52.87 5 0.6657 41.74 6 0.2409 13.94 7 0.3638 21.33 8 0.2152 12.43 9 0.3613 21.18 10 0.1713 9.86 11 0.4861 29.08 12 0.4386 26.01 13 0.7713 50.47 14 0.4394 26.07 15 0.5238 31.59 16 0.4299 25.46 17 0.6585 41.19 18 0.5754 35.13 19 0.2938 17.09 20 0.5461 33.10 21 0.3959 23.32 22 0.6334 39.30 23 0.4332 25.67 24 0.3413 19.96 25 0.3862 22.72 26 0.4018 23.69 27 0.2041 11.78 28 0.3328 19.44 29 0.2731 15.85 30 0.2821 16.39 31 0.4873 29.16 32 0.5471 33.17 33 0.9026 64.50 34 0.8765 61.22 35 0.3044 17.72 36 0.5741 35.04 37 0.2652 15.38 38 0.7108 45.30 39 0.2008 11.58 40 0.1463 8.41 41 0.3362 19.65 42 0.8413 57.28 43 0.7932 52.49 44 0.5042 30.28 45 0.4773 28.51 46 0.4358 25.84 47 0.4411 26.17 48 0.3751 22.03 49 0.2544 14.74 50 0.545 33.02 51 0.4465 26.52 52 0.7277 46.69 53 0.7944 52.60 54 0.7452 48.18 55 0.7614 49.59 56 0.877 61.28 57 0.8838 62.10 58 0.8853 62.29 59 0.8838 62.10 60 0.8838 62.10

TABLE 5 REFRACTIVE INDEX ½ FREE SURFACE RADIUS THICKNESS GLASSES 193.304 nm DIAMETER  0  0.000000000 32.000000000 LUFTV193 1.00030168 56.080  1  0.000000000 0.000000000 LUFTV193 1.00030168 63.258  2  −1268.338705527AS  11.478260873 SIO2V 1.56078570 63.258  3 267.538117540 9.451447213 N2VP950 1.00029966 65.916  4   600.021131212AS 11.500000000 SIO2V 1.56078570 67.578  5 326.741991833 28.091498045 N2VP950 1.00029966 70.893  6 −170.788507842   51.999135922 SIO2V 1.56078570 72.910  7 −330.329053389   1.000000000 N2VP950 1.00029966 99.226  8  −1068.525517497    19.979625145 SIO2V 1.56078570 105.942  9 −387.645501150   1.000000000 N2VP950 1.00029966 109.709 10    −704.568730532AS 42.420550373 SIO2V 1.56078570 113.373 11 −222.016287024   1.000000000 N2VP950 1.00029966 119.118 12 1941.257887377  52.000000000 SIO2V 1.56078570 126.942 13 −469.372066662   3.397916884 N2VP950 1.00029966 129.896 14  −4169.926875111    52.000000000 SIO2V 1.56078570 129.822 15 −295.686690038   1.000000000 N2VP950 1.00029966 130.032 16 159.750938231 51.964442356 SIO2V 1.56078570 108.529 17 376.268786269 1.000000000 N2VP950 1.00029966 97.568 18 307.447954470 51.969227450 SIO2V 1.56078570 95.447 19 116.498974152 31.898186858 N2VP950 1.00029966 65.905 20 −288.097826092   11.500000000 SIO2V 1.56078570 64.079 21   336.397895010AS 37.099202165 N2VP950 1.00029966 60.053 22 −106.320408238   11.500000000 SIO2V 1.56078570 58.050 23 187.789793825 26.304322413 N2VP950 1.00029966 63.753 24 −209.237460909   43.406094751 SIO2V 1.56078570 66.044 25 −216.929048076   1.000000000 N2VP950 1.00029966 82.840 26   1164.410193579AS 23.567441112 SIO2V 1.56078570 92.682 27 −329.001203575   1.000000000 N2VP950 1.00029966 94.132 28 2521.852603301  17.217391310 SIO2V 1.56078570 97.558 29 228.980652217 28.589394523 N2VP950 1.00029966 102.117 30 27241.479244975  36.454077888 SIO2V 1.56078570 105.084 31 −230.122916051   2.961510546 N2VP950 1.00029966 108.362 32 270.925118464 38.714553103 SIO2V 1.56078570 124.500 33   763.688485160AS 35.762711758 N2VP950 1.00029966 123.913 34  0.000000000 10.298384083 N2VP950 1.00029966 124.951 35 305.539519440 25.677979598 SIO2V 1.56078570 131.506 36 216.211099364 24.769069040 N2VP950 1.00029966 128.830 37 382.860100127 50.973600009 SIO2V 1.56078570 130.799 38    −694.560467360AS 5.723480057 N2VP950 1.00029966 131.956 39 325.403745866 49.444778918 SIO2V 1.56078570 131.961 40 −731.949523671   1.000000000 N2VP950 1.00029966 130.439 41 129.520874552 46.268119852 SIO2V 1.56078570 105.425 42 252.827890722 1.000000000 N2VP950 1.00029966 97.727 43 136.184798222 47.793960778 SIO2V 1.56078570 87.092 44 291.218349738 8.959947251 N2VP950 1.00029966 67.069 45   1284.867832510AS 36.652815450 SIO2V 1.56078570 62.759 46 1021.772390757  3.210870937 N2VP950 1.00029966 38.108 47  0.000000000 10.000000000 SIO2V 1.56078570 33.939 48  0.000000000 8.000000000 LUFTV193 1.00030168 27.360 49  0.000000000 0.000000000 1.00000000 14.020 ASPHERIC CONSTANTS SURFACE NR. 2 K  0.0000 C1  1.67561866e−007 C2 −2.12938922e−011 C3  1.69680309e−015 C4 −1.98132595e−019 C5  7.57848219e−024 C6 −1.91694592e−028 C7  7.31348529e−034 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 4 K  0.0000 C1 −7.60044675e−008 C2  1.17354453e−011 C3 −1.30436139e−015 C4  1.52774359e−019 C5 −6.11275102e−024 C6  2.17798015e−028 C7 −4.32254321e−033 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 10 K  0.0000 C1 −1.34208180e−009 C2  2.87384909e−013 C3 −2.97929643e−018 C4 −1.89342955e−022 C5 −5.11583717e−027 C6  1.55819935e−031 C7 −1.40446770e−038 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 21 K  0.0000 C1  1.83877356e−008 C2  2.86899242e−012 C3  3.19518028e−017 C4 −7.19052986e−020 C5  1.13466451e−023 C6 −1.77192399e−027 C7 −1.01670692e−031 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 26 K  0.0000 C1 −1.01472536e−008 C2  1.33731219e−012 C3 −5.43150945e−018 C4  4.71557114e−023 C5 −6.64341291e−026 C6 −3.91519696e−031 C7  6.16634038e−035 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 33 K  0.0000 C1  2.13285827e−009 C2 −5.84623813e−014 C3 −1.42317238e−018 C4  1.10894118e−023 C5 −1.75615181e−027 C6  1.54014495e−031 C7 −3.58350869e−036 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 38 K  0.0000 C1 −4.16611922e−009 C2  4.28615353e−014 C3 −6.79159744e−019 C4 −2.60455674e−023 C5  1.06709496e−027 C6 −7.04980983e−032 C7  3.97315562e−037 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 45 K  0.0000 C1 −1.10987995e−008 C2  6.74554563e−012 C3 −6.08182492e−016 C4  2.40267725e−020 C5 −2.12867221e−024 C6  6.08391245e−028 C7 −5.81691443e−032 C8  0.00000000e+000 C9  0.00000000e+000

TABLE 6 REFRACTIVE INDEX ½ FREE SURFACE RADIUS THICKNESS GLASSES 193.304 nm DIAMETER  0  0.000000000 31.000000000 L710 0.99998200 56.080  1  0.000000000 1.000000000 HE193 0.99971200 62.856  2   324.818247939AS 8.109025357 SIO2HL 1.56028895 64.646  3 219.117611826 5.509660348 HE193 0.99971200 65.135  4   289.200300616AS 7.000000000 SIO2HL 1.56028895 66.381  5 227.856104705 17.243048254 HE193 0.99971200 66.734  6 −377.649070374   7.000000000 SIO2HL 1.56028895 67.059  7 387.641770903 30.796463985 HE193 0.99971200 71.597  8 −125.714248975   54.975207900 SIO2HL 1.56028895 72.277  9 −176.955529980   1.000000000 HE193 0.99971200 100.007 10  −1297.534896140    31.636302227 SIO2HL 1.56028895 114.600 11 −320.961128376   1.000000000 HE193 0.99971200 119.511 12 936.880173082 44.820142873 SIO2HL 1.56028895 130.745 13 −328.618771838   3.088384233 HE193 0.99971200 131.968 14 317.146646669 32.169396486 SIO2HL 1.56028895 131.861 15 1880.972057190  78.800003484 HE193 0.99971200 130.569 16 778.616134901 21.855706412 SIO2HL 1.56028895 112.867 17  −1344.892951770    2.120584882 HE193 0.99971200 111.151 18 184.194583638 26.864832492 SIO2HL 1.56028895 98.404 19 117.923993472 8.944323916 HE193 0.99971200 83.450 20 122.599592610 50.092138884 SIO2HL 1.56028895 82.216 21 123.591716800 52.677842672 HE193 0.99971200 66.129 22 −133.413687632   7.000000000 SIO2HL 1.56028895 59.894 23 201.636820203 31.091699285 HE193 0.99971200 59.866 24 −117.122170355   22.371886041 SIO2HL 1.56028895 60.770 25 271.237822926 18.190270939 HE193 0.99971200 77.184 26 −828.307583707   23.724292231 SIO2HL 1.56028895 80.324 27 −217.730531706   1.629365175 HE193 0.99971200 86.028 28 24863.715253700  23.891029762 SIO2HL 1.56028895 99.050 29 −340.154546232   1.000000000 HE193 0.99971200 102.080 30 499.177180862 33.230036742 SIO2HL 1.56028895 114.528 31 −613.861853920   4.746303203 HE193 0.99971200 115.894 32    −515.657687359AS 7.000000000 SIO2HL 1.56028895 116.027 33  −2799.133265700    28.850953586 HE193 0.99971200 119.520 34 −374.801866679   25.903304270 SIO2HL 1.56028895 122.380 35 −229.064488423   3.130798012 HE193 0.99971200 125.091 36  0.000000000 4.590309473 HE193 0.99971200 129.531 37  0.000000000 −1.761443244 HE193 0.99971200 129.976 38 480.603781326 23.812586743 SIO2HL 1.56028895 134.088 39 259.375898088 8.237844188 HE193 0.99971200 135.910 40 312.231631384 55.513942588 SIO2HL 1.56028895 136.609 41 −596.581070286   4.943886708 HE193 0.99971200 137.420 42 371.538894387 38.328387113 SIO2HL 1.56028895 138.683 43 −20570.555487000AS  2.057897803 HE193 0.99971200 137.171 44 186.804638892 55.000000000 SIO2HL 1.56028895 127.714 45 371.539070225 13.149085685 HE193 0.99971200 117.755 46 136.294111489 54.999981718 SIO2HL 1.56028895 99.988 47   527.773767013AS 1.000000000 HE193 0.99971200 86.981 48 170.379719961 35.449588232 SIO2HL 1.56028895 76.078 49   292.013444451AS 7.226713258 HE193 0.99971200 57.583 50  0.000000000 27.238216082 CAF2HL 1.50143563 54.452 51  0.000000000 1.500000000 HE193 0.99971200 35.406 52  0.000000000 10.000000000 SIO2HL 1.56028895 32.871 53  0.000000000 7.250000000 L710 0.99998200 26.261 54  0.000000000 0.000000000 1.00000000 14.020 ASPHERIC CONSTANTS SURFACE NR. 2 K −1.8845 C1  5.29821153e−008 C2 −4.43279002e−012 C3  1.28707472e−015 C4 −2.39343289e−019 C5  1.99234178e−023 C6  2.46399483e−027 C7 −4.33709316e−031 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 4 K  0.1824 C1  7.99717816e−008 C2  3.44235754e−013 C3 −1.08433322e−015 C4  2.49428499e−019 C5 −4.04263889e−023 C6  2.92251162e−027 C7 −2.35276355e−032 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 32 K  0.0000 C1 −1.27754362e−008 C2  3.02764844e−013 C3  1.00750526e−018 C4 −6.13679336e−023 C5  4.38665224e−027 C6 −3.40250286e−031 C7  1.46968938e−035 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 43 K  0.0000 C1  1.57685663e−009 C2  1.02156359e−013 C3 −1.70007813e−018 C4 −2.26737767e−023 C5  2.28492082e−027 C6 −1.04091200e−031 C7  2.34019985e−036 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 47 K  6.8784 C1  1.53142434e−008 C2 −3.32257012e−013 C3  8.40396973e−017 C4 −1.22248965e−020 C5  1.29284065e−024 C6 −8.69096802e−029 C7  1.99745782e−033 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 49 K  0.0000 C1 −2.17885424e−008 C2 −4.43299434e−013 C3 −1.44194471e−015 C4  2.99216702e−019 C5 −8.06687258e−023 C6  1.77963946e−026 C7 −1.41052000e−030 C8  0.00000000e+000 C9  0.00000000e+000

TABLE 6a Surface SINImax Imax [deg] 0 1 0.219 12.65 2 0.4466 26.53 3 0.5367 32.46 4 0.5376 32.52 5 0.5296 31.98 6 0.2882 16.75 7 0.6327 39.25 8 0.3718 21.83 9 0.267 15.49 10 0.4034 23.79 11 0.2126 12.27 12 0.4555 27.10 13 0.4051 23.90 14 0.4202 24.85 15 0.2164 12.50 16 0.2138 12.35 17 0.42 24.83 18 0.2187 12.63 19 0.5589 33.98 20 0.5152 31.01 21 0.3269 19.08 22 0.7092 45.17 23 0.5457 33.07 24 0.3583 21.00 25 0.9082 65.26 26 0.7085 45.11 27 0.3348 19.56 28 0.6244 38.64 29 0.2345 13.56 30 0.6387 39.69 31 0.0877 5.03 32 0.1301 7.48 33 0.323 18.84 34 0.0718 4.12 35 0.4628 27.57 36 0.2345 13.56 37 0.2345 13.56 38 0.4873 29.16 39 0.8491 58.11 40 0.7965 52.80 41 0.328 19.15 42 0.3866 22.74 43 0.274 15.90 44 0.5254 31.70 45 0.2422 14.02 46 0.3632 21.30 47 0.6501 40.55 48 0.4858 29.06 49 0.8107 54.16 50 0.8759 61.15 51 0.8759 61.15 52 0.8759 61.15 53 0.8759 61.15 54 0.8759 61.15

TABLE 7 REFRACTIVE INDEX ½ FREE SURFACE RADIUS THICKNESS GLASSES 193.304 nm DIAMETER  0  0.000000000 31.000000000 L710 0.99998200 56.080  1  0.000000000 1.000000000 HE193 0.99971200 62.856  2   324.818247939AS 8.109025357 SIO2HL 1.56028895 64.646  3 219.117611826 5.508087220 HE193 0.99971200 65.135  4   289.200300616AS 7.000000000 SIO2HL 1.56028895 66.381  5 227.856104705 17.243070148 HE193 0.99971200 66.734  6 −377.649070374   7.000000000 SIO2HL 1.56028895 67.059  7 387.641770903 30.765544016 HE193 0.99971200 71.598  8 −125.714248975   54.975207900 SIO2HL 1.56028895 72.265  9 −176.955529980   1.000000000 HE193 0.99971200 99.993 10  −1297.534896140    31.636302227 SIO2HL 1.56028895 114.582 11 −320.961128376   1.000000000 HE193 0.99971200 119.494 12 936.880173082 44.820142873 SIO2HL 1.56028895 130.726 13 −328.618771838   3.492277374 HE193 0.99971200 131.951 14 317.146646669 32.169396486 SIO2HL 1.56028895 131.848 15 1880.972057190  78.466159550 HE193 0.99971200 130.555 16 778.616134901 21.855706412 SIO2HL 1.56028895 112.930 17  −1344.892951770    1.631223556 HE193 0.99971200 111.218 18 184.194583638 26.864832492 SIO2HL 1.56028895 98.601 19 117.923993472 8.738538132 HE193 0.99971200 83.612 20 122.599592610 50.092138884 SIO2HL 1.56028895 82.419 21 123.591716800 53.386697866 HE193 0.99971200 66.332 22 −133.413687632   7.000000000 SIO2HL 1.56028895 59.919 23 201.636820203 31.123951016 HE193 0.99971200 59.900 24 −117.122170355   22.371886041 SIO2HL 1.56028895 60.806 25 271.237822926 18.548517752 HE193 0.99971200 77.260 26 −828.307583707   23.724292231 SIO2HL 1.56028895 80.717 27 −217.730531706   1.000000000 HE193 0.99971200 86.373 28 24863.715253700  23.891029762 SIO2HL 1.56028895 99.099 29 −340.154546232   1.000000000 HE193 0.99971200 102.128 30 499.177180862 33.230036742 SIO2HL 1.56028895 114.615 31 −613.861853920   4.746303203 HE193 0.99971200 115.978 32    −515.657687359AS 7.000000000 SIO2HL 1.56028895 116.111 33  −2799.133265700    28.850953586 HE193 0.99971200 119.614 34 −374.801866679   25.903304270 SIO2HL 1.56028895 122.472 35 −229.064488423   3.130798012 HE193 0.99971200 125.181 36  0.000000000 5.173121288 HE193 0.99971200 129.642 37  0.000000000 1.000000000 HE193 0.99971200 130.135 38 474.346153969 24.214285976 SIO2HL 1.56028895 134.997 39 257.158432536 8.053951335 HE193 0.99971200 136.742 40 306.376423539 57.804293441 SIO2HL 1.56028895 137.456 41 −562.895510400   1.000000000 HE193 0.99971200 138.239 42 372.293287787 33.212051475 SIO2HL 1.56028895 138.770 43  12328.532325400AS 1.106587587 HE193 0.99971200 137.675 44 193.144605329 54.576878288 SIO2HL 1.56028895 128.685 45 379.786426378 16.773776607 HE193 0.99971200 118.623 46 134.855937913 55.000000000 SIO2HL 1.56028895 99.496 47   536.515306116AS 1.080464261 HE193 0.99971200 86.795 48 173.206435013 35.323967088 SIO2HL 1.56028895 76.056 49   299.060830919AS 6.563458346 HE193 0.99971200 57.738 50  0.000000000 28.341741198 SIO2HL 1.56028895 55.402 51  0.000000000 1.500000000 HE193 0.99971200 36.669 52  0.000000000 10.000000000 SIO2HL 1.56028895 34.134 53  0.000000000 7.999999986 L710 0.99998200 27.525 54  0.000000000 0.000000000 1.00000000 14.020 ASPHERIC CONSTANTS SURFACE NR. 2 K −1.8845 C1  5.29821153e−008 C2 −4.43279002e−012 C3  1.28707472e−015 C4 −2.39343289e−019 C5  1.99234178e−023 C6  2.46399483e−027 C7 −4.33709316e−031 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 4 K  0.1824 C1  7.99717816e−008 C2  3.44235754e−013 C3 −1.08433322e−015 C4  2.49428499e−019 C5 −4.04263889e−023 C6  2.92251162e−027 C7 −2.35276355e−032 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 32 K  0.0000 C1 −1.27754362e−008 C2  3.02764844e−013 C3  1.00750526e−018 C4 −6.13679336e−023 C5  4.38665224e−027 C6 −3.40250286e−031 C7  1.46968938e−035 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 43 K  0.0000 C1  1.36549730e−009 C2  1.02306815e−013 C3 −1.35739896e−018 C4 −1.99345093e−023 C5  1.59224599e−027 C6 −6.75882258e−032 C7  1.39559460e−036 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 47 K  7.2953 C1  1.61057750e−008 C2 −5.05815963e−013 C3  8.84032736e−017 C4 −1.11981147e−020 C5  1.14085256e−024 C6 −7.43387672e−029 C7  1.41113763e−033 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 49 K  0.0000 C1 −3.00219975e−008 C2 −1.20927625e−013 C3 −1.49865939e−015 C4  3.27847128e−019 C5 −9.19939235e−023 C6  2.08807060e−026 C7 −1.71435366e−030 C8  0.00000000e+000 C9  0.00000000e+000

TABLE 7a Surface SINImax Imax [deg] 0 1 0.219 12.65 2 0.4466 26.53 3 0.5367 32.46 4 0.5376 32.52 5 0.5296 31.98 6 0.2882 16.75 7 0.6327 39.25 8 0.3718 21.83 9 0.267 15.49 10 0.4034 23.79 11 0.2126 12.27 12 0.4555 27.10 13 0.405 23.89 14 0.4202 24.85 15 0.2164 12.50 16 0.2137 12.34 17 0.4201 24.84 18 0.22 12.71 19 0.561 34.12 20 0.5177 31.18 21 0.3253 18.98 22 0.7092 45.17 23 0.5458 33.08 24 0.3582 20.99 25 0.9092 65.40 26 0.7085 45.11 27 0.3328 19.44 28 0.6241 38.62 29 0.2343 13.55 30 0.6385 39.68 31 0.0876 5.03 32 0.1299 7.46 33 0.3229 18.84 34 0.0715 4.10 35 0.463 27.58 36 0.2344 13.56 37 0.2344 13.56 38 0.4921 29.48 39 0.8574 59.03 40 0.8079 53.89 41 0.3555 20.82 42 0.373 21.90 43 0.2616 15.17 44 0.503 30.20 45 0.2398 13.87 46 0.377 22.15 47 0.6524 40.72 48 0.492 29.47 49 0.8135 54.44 50 0.876 61.16 51 0.876 61.16 52 0.876 61.16 53 0.876 61.16 54 0.876 61.16

TABLE 8 REFRACTIVE INDEX ½ FREE SURFACE RADIUS THICKNESS GLASSES 193.304 nm DIAMETER  0  0.000000000 34.598670703 LUFTV193 1.00030168 56.080  1  0.000000000 5.480144837 LUFTV193 1.00030168 64.122  2   6478.659586000AS 10.843585909 SIO2V 1.56078570 65.807  3  −1354.203087320    2.423172128 N2VP950 1.00029966 66.705  4  −1087.803716660    9.621961389 SIO2V 1.56078570 67.029  5 183.366808766 2.746190506 N2VP950 1.00029966 70.249  6   206.367008633AS 8.085673658 SIO2V 1.56078570 71.462  7 193.387116101 36.794320510 N2VP950 1.00029966 72.483  8 −140.799169619   50.095071588 SIO2V 1.56078570 73.484  9 −373.463518266   1.000056376 N2VP950 1.00029966 103.736 10 −561.452806488   22.561578822 SIO2V 1.56078570 107.508 11 −263.612680429   1.000756794 N2VP950 1.00029966 111.562 12 −49392.564837400AS  53.841314203 SIO2V 1.56078570 124.515 13 −266.359005048   15.247580669 N2VP950 1.00029966 130.728 14 840.618794866 29.011390428 SIO2V 1.56078570 141.616 15 −926.722502535   1.005611320 N2VP950 1.00029966 142.120 16 2732.904696180  38.725041529 SIO2V 1.56078570 141.999 17    −356.203262494AS 2.005496104 N2VP950 1.00029966 141.858 18 318.151930355 16.617316424 SIO2V 1.56078570 124.740 19 513.819497301 1.562497532 N2VP950 1.00029966 122.663 20 171.455700974 30.277693574 SIO2V 1.56078570 111.385 21 154.841382726 1.064445848 N2VP950 1.00029966 98.077 22 127.756841801 43.191494812 SIO2V 1.56078570 94.695 23 104.271940246 52.476004091 N2VP950 1.00029966 74.378 24 −283.692700248   8.000000007 SIO2V 1.56078570 68.565 25 242.925344027 39.949819872 N2VP950 1.00029966 64.404 26 −117.414778719   8.181191942 SIO2V 1.56078570 63.037 27 197.144513187 26.431530314 N2VP950 1.00029966 69.190 28 −244.477949570   44.225451360 SIO2V 1.56078570 71.085 29 −230.356430065   1.409104251 N2VP950 1.00029966 88.427 30   1472.096760620AS 21.137736519 SIO2V 1.56078570 99.340 31 −450.715283484   1.259333876 N2VP950 1.00029966 101.126 32 3573.378947270  8.391191259 SIO2V 1.56078570 105.206 33 7695.066698120  1.258010005 N2VP950 1.00029966 106.474 34 1029.326174920  8.390466230 SIO2V 1.56078570 108.186 35 243.058844043 29.823514356 N2VP950 1.00029966 112.152 36 29057.985214100  38.911793339 SIO2V 1.56078570 114.058 37 −232.205630821   1.000000003 N2VP950 1.00029966 116.928 38 270.144711058 55.850950401 SIO2V 1.56078570 139.162 39   1183.955771760AS 20.935175304 N2VP950 1.00029966 138.048 40  0.000000000 −2.958030543 N2VP950 1.00029966 138.244 41 368.838236812 22.472409726 SIO2V 1.56078570 141.049 42 220.058626892 26.974361640 N2VP950 1.00029966 137.707 43 355.728536436 58.022036072 SIO2V 1.56078570 140.923 44    −861.478061183AS 4.104303800 N2VP950 1.00029966 142.103 45 420.713002153 55.049896341 SIO2V 1.56078570 142.502 46 −478.998238339   1.000000000 N2VP950 1.00029966 141.431 47 122.579574949 48.569396230 SIO2V 1.56078570 106.623 48   223.612364366AS 1.000000000 N2VP950 1.00029966 99.428 49 132.028746911 49.487311459 SIO2V 1.56078570 88.176 50 247.223694320 10.595001724 N2VP950 1.00029966 65.249 51   712.954951376AS 8.355490390 SIO2V 1.56078570 57.430 52 163.735058824 3.094306970 N2VP950 1.00029966 47.446 53 154.368612651 19.294967287 SIO2V 1.56078570 44.361 54 677.158668491 2.851896407 N2VP950 1.00029966 33.956 55  0.000000000 10.000000000 SIO2V 1.56078570 29.666 56  0.000000000 4.000000000 LUFTV193 1.00030168 22.559 57  0.000000000 0.000000000 1.00000000 14.020 ASPHERIC CONSTANTS SURFACE NR. 2 K  0.0000 C1  1.38277367e−007 C2 −1.88982133e−011 C3  1.94899866e−015 C4 −3.04512613e−019 C5  3.31424645e−023 C6 −2.70316185e−027 C7  1.30470314e−031 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 6 K  0.0000 C1 −1.02654080e−008 C2  1.22477004e−011 C3 −1.70638250e−015 C4  2.48526394e−019 C5 −2.38582445e−023 C6  1.51451580e−027 C7 −6.30610228e−032 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 12 K  0.0000 C1 −3.36870323e−009 C2  1.77350477e−013 C3  1.19052376e−019 C4 −1.17127296e−022 C5 −9.25382522e−027 C6  4.88058037e−031 C7 −1.32782815e−035 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 17 K  0.0000 C1  2.29017476e−010 C2  4.92394931e−014 C3  2.34180010e−019 C4 −2.74433865e−023 C5  8.02938234e−029 C6 −1.05282366e−032 C7 −1.44319713e−038 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 30 K  0.0000 C1 −1.51349530e−008 C2  9.73999326e−013 C3  8.62745113e−018 C4  5.94720340e−022 C5 −4.71903409e−026 C6  2.87654316e−031 C7  4.40822786e−035 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 39 K  0.0000 C1  5.16807805e−009 C2 −6.52986543e−014 C3 −6.91577796e−019 C4 −3.61532300e−024 C5 −1.38222518e−027 C6  1.06689880e−031 C7 −1.65303231e−036 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 44 K  0.0000 C1 −3.74086200e−009 C2  9.09495287e−014 C3 −9.58269360e−019 C4  2.46215375e−023 C5 −8.23397865e−028 C6  1.33400957e−032 C7 −5.95002910e−037 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 48 K  0.0000 C1 −2.07951112e−009 C2 −3.24793684e−014 C3 −4.06763809e−018 C4 −4.85274422e−022 C5  2.39376432e−027 C6  2.44680800e−030 C7 −5.62502628e−035 C8  0.00000000e+000 C9  0.00000000e+000 SURFACE NR. 51 K  0.0000 C1 −6.57065732e−009 C2  2.35659016e−012 C3 −1.23585829e−016 C4  5.34294269e−020 C5 −1.12897797e−023 C6  1.37710849e−027 C7 −1.15055048e−031 C8  0.00000000e+000 C9  0.00000000e+000

TABLE 8a Surface SINImax Imax [deg] 0 1 0.2265 13.09 2 0.2921 16.98 3 0.3021 17.58 4 0.3093 18.02 5 0.7727 50.60 6 0.7815 51.40 7 0.7503 48.62 8 0.3748 22.01 9 0.3301 19.27 10 0.4126 24.37 11 0.2102 12.13 12 0.4461 26.49 13 0.3287 19.19 14 0.3408 19.93 15 0.2163 12.49 16 0.1724 9.93 17 0.6379 39.64 18 0.1545 8.89 19 0.21 12.12 20 0.3165 18.45 21 0.284 16.50 22 0.4232 25.04 23 0.3618 21.21 24 0.6198 38.30 25 0.4029 23.76 26 0.6229 38.53 27 0.7684 50.21 28 0.4293 25.42 29 0.2783 16.16 30 0.5705 34.79 31 0.2529 14.65 32 0.4358 25.84 33 0.4179 24.70 34 0.4824 28.84 35 0.8986 63.97 36 0.6723 42.24 37 0.2232 12.90 38 0.8128 54.37 39 0.2534 14.68 40 0.1112 6.38 41 0.4829 28.87 42 0.8791 61.53 43 0.7207 46.11 44 0.2809 16.31 45 0.3478 20.35 46 0.6869 43.39 47 0.6164 38.05 48 0.4133 24.41 49 0.2042 11.78 50 0.7917 52.34 51 0.8696 60.41 52 0.7273 46.66 53 0.7381 47.57 54 0.901 64.29 55 0.9059 64.94 56 0.9059 64.94 57 0.9059 64.94 

1. A refractive projection objective for microlithography with a numerical aperture NA greater than 0.7, consisting of: a first lens group immediately following an object plane of the projection objective and having negative refractive power; a second lens group immediately following the first lens group and having positive refractive power; a third lens group immediately following the second lens group and having negative refractive power for generating a constriction of a light beam passing through the projection objective; a fourth lens group immediately following the third lens group and having positive refractive power; and a fifth lens group immediately following the fourth lens group and having positive refractive power; the projection objective thereby consisting of a first convexity, a second convexity, and a waist arranged between the first and second convexity, wherein the first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8<D₁/D₂<1.1.
 2. A refractive projection objective according to claim 1, wherein the following relationship of the maximum diameters holds: 0.9<D ₁ /D ₂<1.0.
 3. A refractive projection objective which, in the direction of propagation of the light, consists of a first lens group with negative refractive power, of a second lens group with positive refractive power, and of a third lens group with negative refractive power, for the provision of a constriction of the light beam, and of a following fourth lens group with positive refractive power, and of a system diaphragm with a following fifth lens group, which has positive refractive power, wherein before the diaphragm and after the diaphragm a respective meniscus lens curved toward the object is arranged.
 4. A refractive projection objective according to claim 2, wherein the following relationships holds: L·D _(max)/(NA·2 yb)<12,850, where L is the constructional length measured from the object plane to the image plane of the projection objective, NA is the image-side numerical aperture, D_(MAX) is the maximum diameter of the system and thus is D1 or D2, and 2 yb is the diameter of the image field.
 5. A refractive projection objective according to claim 1, wherein the first lens group has at least two negative lenses.
 6. A refractive projection objective consisting of a first convexity, a second convexity, a waist arranged between the two convexities and having a place of narrowest constriction, and a system diaphragm arranged in the second convexity, wherein two meniscus lenses with convex surfaces turned toward each other are arranged after the place of narrowest constriction and before the system diaphragm.
 7. A refractive projection objective consisting of a first convexity, a following waist, and following this a second convexity, a system diaphragm being arranged in the second convexity, and the region from the object plane O to the last lens surface facing toward the diaphragm being denoted by L_(F), and the region from the first lens surface following the diaphragm to the image plane being denoted by L_(R), and the region between L_(P) and L_(R) being denoted by L_(AP), wherein, for the length ratio LV, the following holds: $\begin{matrix} {{LV} = \frac{2 \cdot L_{AP} \cdot \left( \frac{L_{geo}}{L - L_{AP}} \right)}{L}} & \quad & \quad & {{{LV} \geq 0.1},} \end{matrix}$ where L_(geo) is the sum over the middle thicknesses of all the lenses arranged in the objective and L is the distance from the image plane O′ to the object plane O.
 8. A refractive projection objective according to claim 7, wherein the numerical aperture NA is greater than 0.7.
 9. A refractive projection objective according to claim 1, wherein an etendue value of the projection objective is greater than 2% of the constructional length, the etendue value being defined as the product of the image field diameter and the image-side numerical aperture.
 10. A refractive projection objective according to claim 1, wherein only lenses of one material are used.
 11. A refractive projection objective according to claim 1, wherein the ratio of constructional length (OO′) and focal length of the fifth lens group is greater than eight.
 12. A refractive projection objective according to claim 1, wherein the first lens group contains at least one aspheric surface.
 13. A refractive projection objective according to claim 12, wherein the first lens group contains two aspheric surfaces on lens surfaces turned toward the object plane.
 14. A refractive projection objective according to claim 12, wherein aspheric surfaces situated in the first lens group are situated on converging lens surfaces turned toward the object plane.
 15. A refractive projection objective according to claim 1, wherein, when aspheric surfaces are used in the third lens group these are always used on surfaces turned toward the image plane of the projection objective.
 16. A refractive projection objective according to claim 1, wherein no aspheric surfaces are provided in the third lens group.
 17. A refractive projection objective according to claim 1, wherein in the first lens group at least one meniscus lens, convex toward the object plane and with negative refractive power, is arranged.
 18. A refractive projection objective according to claim 1, wherein the fifth lens group contains at least two aspheric surfaces.
 19. A refractive projection objective according to claim 1, wherein the fifth lens group contains at least two biconvex lenses and two converging meniscuses, concave toward the image.
 20. A refractive projection objective according to claim 1, wherein the fifth lens group has a maximum of 5 converging lenses.
 21. A refractive projection objective according to claim 1, wherein, in the first and second lens groups, a height of a principal ray for an outermost field point is greater than a height of a marginal ray for imaging an axis point, this ratio being reversed within the third lens group.
 22. A refractive projection objective according to claim 1, wherein a maximum height of a marginal ray for imaging the axis point is more than three times as large as its height in the narrowest constriction in the third lens group.
 23. A refractive projection objective according to claim 1, wherein the maximum diameter of the second lens group is twice as large as the object field diameter.
 24. A refractive projection objective according to claim 1, wherein the minimum free diameter in the third lens group is smaller than 1.2 times the object field diameter.
 25. A projection objective for microlithography including a projection objective according to claim
 1. 26. A refractive projection objective according to claim 1, comprising a plurality of refractive elements, with a plurality of light rays incident at incident angles to each refractive element and exiting at exit angles, where at each refractive element a maximum incident angle and a maximum exit angle exists, wherein at least one refractive element which is separated from an image plane of the projection objective by at least one refractive elements, has a maximum incident angle or maximum exit angle in excess of 60 degrees measured in the optically thin medium surrounding said refractive element.
 27. A refractive projection objective according to claim 26, wherein at least one refractive element which is separated from an image plane of the projection objective by two to four refractive elements, has a maximum incident angle or maximum exit angle in excess of 60 degrees measured in the optically thin medium surrounding said refractive element.
 28. A refractive projection objective according to claim 26, wherein at least one refractive element has a maximum exit angle in excess of 60 degrees.
 29. A refractive projection objective according to claim 28, wherein the refractive element having a maximum exit angle in excess of 60 degrees is a meniscus lens with an image side concave surface.
 30. A refractive projection objective according to claim 26, wherein at least one of four refractive elements situated next to a system diaphragm of said objective has a maximum incident angle or a maximum exit angle in excess of 60 degrees.
 31. A refractive projection objective according to claim 30, wherein said at least one of said four refractive elements situated next to a system diaphragm is a meniscus lens.
 32. A refractive projection objective according to claim 26, wherein at least one refractive element situated between an object plane and a system diaphragm of said projection objective has a maximum incident angle or a maximum exit angle in excess of 60 degrees.
 33. A refractive projection objective according to claim 32, wherein said at least one refractive element is situated as one of four refractive elements next to the waist.
 34. A refractive projection objective according to claim 26, wherein at least one refractive element has a maximum incident angle or a maximum exit angle in the range of 50 degrees to 60 degrees and is situated as one of four refractive elements next to a system diaphragm.
 35. A refractive projection objective according to claim 26, wherein at least one refractive element bears an antireflective coating of radially varying incident or exit angle specific properties.
 36. A refractive projection objective according to claim 35, wherein said refractive element is one having a maximum incident angle or a maximum exit angle in excess of 50 degrees.
 37. A refractive projection objective according to claim 35, wherein said refractive element is one having a maximum incident angle or a maximum exit angle in excess of 60 degrees.
 38. A refractive projection objective according to claim 3, wherein the meniscus lens before the diaphragm is arranged immediately before the diaphragm and wherein the meniscus lens after the diaphragm is arranged immediately after the diaphragm.
 39. A refractive projection objective according to claim 38, wherein the meniscus lens immediately before the diaphragm has positive refractive power and the meniscus lens immediately after the diaphragm has negative refractive power and wherein concave surfaces of the meniscus lenses are facing towards an image plane of the projection objective.
 40. A refractive projection objective according to claim 3, wherein the fourth lens group includes at least one negative lens having an image-side concave surface.
 41. A refractive projection objective according to claim 3, wherein the fourth lens group includes at least one piano-concave lens having an object-side plane surface and an image-side concave surface.
 42. A refractive projection objective according to claim 3, wherein the fourth lens group includes at least one negative meniscus lens having an image-side concave surface.
 43. A refractive projection objective according to claim 3, wherein the fourth lens group includes two meniscus lenses each having an image-side concave surface.
 44. A refractive projection objective according to claim 1, wherein the meniscus lens immediately before the diaphragm has positive refractive power and the meniscus lens immediately after the diaphragm has negative refractive power and wherein concave surfaces of the meniscus lenses are facing towards an image plane of the projection objective.
 45. A refractive projection objective according to claim 1, wherein the fourth lens group includes at least one negative lens having an image-side concave surface.
 46. A refractive projection objective according to claim 1, wherein the fourth lens group includes at least one plano-concave lens having an object-side plane surface and an image-side concave surface.
 47. A refractive projection objective according to claim 1, wherein the fourth lens group includes at least one negative meniscus lens having an image-side concave surface.
 48. A refractive projection objective according to claim 1, wherein the fourth lens group includes two meniscus lenses each having an image-side concave surface.
 49. A refractive projection objective according to claim 6, wherein the two meniscus lenses with convex surfaces turned towards each other are arranged immediately before the system diaphragm.
 50. A refractive projection objective consisting of a first convexity, a second convexity, a waist arranged between the first and the second convexity and having a place of narrowest constriction, and a system diaphragm arranged in the second convexity, wherein a positive lens, a negative lens, a positive lens and a further positive lens are arranged in this order after the waist and immediately before the system diaphragm.
 51. A refractive projection objective according to claim 50, wherein two meniscus lenses having concave surfaces facing each other are arranged immediately before the system diaphragm.
 52. A refractive projection objective according to claim 50, wherein a lens group consisting of a plano-convex lens and a converging meniscus lens having convex surfaces facing each other is arranged after the place of narrowest constriction and immediately before the system diaphragm.
 53. A refractive projection objective consisting of a first convexity, a second convexity and a waist arranged between the first and second convexity and having a place of narrowest constriction, wherein a negative lens is arranged in a transition region between the place of narrowest constriction and the system diaphragm and wherein no more than two lenses are arranged between that negative lens and the system diaphragm.
 54. A refractive projection objective according to claim 1, wherein two diverging meniscus lenses having convex surfaces facing the object plane are arranged in the first lens group.
 55. A refractive projection objective according to claim 1, wherein at least three converging meniscus lenses and a biconvex positive lens are arranged in the second lens group, wherein at least one of the meniscus lenses has an object-side concave surface and at least one meniscus lens has an image-side concave surface.
 56. A refractive projection objective according to claim 1, wherein the forth lens group has a first surface facing the object plane and a last surface facing the image plane and wherein the first surface and the last surface are aspheric surfaces.
 57. A refractive projection objective according to claim 1, wherein a concave aspheric surface is arranged immediately before the system diaphragm.
 58. A refractive projection objective according to claim 1, wherein the forth lens group has no more than four lenses.
 59. A refractive projection objective according to claim 1, wherein an aspheric surface is arranged on an image-side lens surface and another aspheric surface is arranged on an object-side surface of a lens in the fifth lens group.
 60. A refractive projection objective according to claim 1, wherein all aspheric surfaces arranged in the fifth lens group are arranged on an image-side lens surface of a lens with positive refractive power.
 61. A refractive projection objective according to claim 1, wherein the fifth lens group includes at least two consecutive converging meniscus lenses and wherein aspheric surfaces are arranged on these meniscus lenses.
 62. A refractive projection objective according to claim 1, wherein the fifth lens group has no more than one diverging lens.
 63. A refractive projection objective for projecting a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of ultraviolet light of a prescribed operating wavelength at an image side numerical aperture NA>0.7 comprising: a multiplicity of optical elements which are arranged along an optical axis; and a system diaphragm arranged at a distance in front of the image plane; the projection objective being designed as a purely refractive single-waist system with a first convexity near the object plane, a second convexity near the image plane and a waist therebetween, the first convexity having a maximum diameter denoted by D1, and the second convexity having a maximum diameter denoted by D2, where 0.8<D₁/D₂<1.1; and a negative group having an effective curvature with a concave side directed towards the image being arranged in a region of divergent radiation between the waist and the system diaphragm.
 64. A refractive projection objective according to claim 63, wherein the negative group comprises at least one lens with negative refractive power, and a concave surface directed towards the image plane.
 65. A refractive projection objective according to claim 63, wherein the negative group comprises exactly two lenses with negative refractive power and concave surfaces each directed towards the image.
 66. A refractive projection objective according to claim 64, wherein the lens with negative refractive power is a meniscus lens.
 67. A refractive projection objective for projecting a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of ultraviolet light of a prescribed operating wavelength at an image side numerical aperture NA>0.7 comprising: a first lens group immediately following the object plane and having negative refractive power; a second lens group immediately following the first lens group and having positive refractive power; a third lens group immediately following the third lens group and having negative refractive power for generating a waist; a fourth lens group immediately following the third lens group and having positive refractive power; a fifth lens group immediately following the fourth lens group and having positive refractive power; and a system diaphragm arranged between the fourth and the fifth lens group at a distance in front of the image plane; wherein a meniscus lens curved toward the object plane is arranged immediately before the system diaphragm and a meniscus lens curved toward the object plane is arranged immediately after the system diaphragm; and wherein a negative group having an effective curvature with a concave side directed towards the image plane is arranged in a region of divergent radiation between the waist and the system diaphragm.
 68. A refractive projection objective according to claim 67, wherein the negative group comprises at least one lens with negative refractive power, and a concave surface directed towards the image plane.
 69. A refractive projection objective according to claim 67, wherein the negative group comprises exactly two lenses with negative refractive power and concave surfaces each directed towards the image.
 70. A refractive projection objective according to claim 68, wherein the lens with negative refractive power is a meniscus lens.
 71. A refractive projection objective for projecting a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of ultraviolet light of a prescribed operating wavelength at an image side numerical aperture NA>0.7 comprising: a first lens group immediately following the object plane and having negative refractive power; a second lens group immediately following the first lens group and having positive refractive power; a third lens group immediately following the third lens group and having negative refractive power for generating a place of narrowest constriction of a light beam passing through the projection objective; a fourth lens group immediately following the third lens group and having positive refractive power; a fifth lens group immediately following the fourth lens group and having positive refractive power; and a system diaphragm arranged between the fourth and the fifth lens group at a distance in front of the image plane; wherein two meniscus lenses with convex surfaces turned toward each other are arranged after the place of narrowest constriction and before the system diaphragm; and wherein a negative group having an effective curvature with a concave side directed towards the image plane is arranged in a region of divergent radiation between the waist and the system diaphragm.
 72. A refractive projection objective according to claim 71, wherein the negative group comprises at least one lens with negative refractive power, and a concave surface directed towards the image plane.
 73. A refractive projection objective according to claim 71, wherein the negative group comprises exactly two lenses with negative refractive power and concave surfaces each directed towards the image.
 74. A refractive projection objective according to claim 72, wherein the lens with negative refractive power is a meniscus lens.
 75. A refractive projection objective according to claim 71, wherein the two meniscus lenses with convex surfaces turned towards each other are arranged after the negative group and immediately before the system diaphragm.
 76. A method for the production of microstructured components, comprising: providing a substrate with a photosensitive layer; and exposing the substrate with ultraviolet light utilizing a mask and a projection exposure device having a refractive projection objective according to claim 1, whereby the substrate is structured in accordance with a pattern contained on the mask.
 77. The method according to claim 76, further comprising developing the photosensitive layer subsequent to said exposing, for structuring the substrate in accordance with the pattern contained on the mask.
 78. A method for the production of microstructured components, comprising: providing a substrate with a photosensitive layer; and exposing the substrate with ultraviolet light utilizing a mask and a projection exposure device having a refractive projection objective according to claim 3, whereby the substrate is structured in accordance with a pattern contained on the mask.
 79. The method according to claim 78, further comprising developing the photosensitive layer subsequent to said exposing, for structuring the substrate in accordance with the pattern contained on the mask.
 80. A method for the production of microstructured components, comprising: providing a substrate with a photosensitive layer; and exposing the substrate with ultraviolet light utilizing a mask and a projection exposure device having a refractive projection objective according to claim 6, whereby the substrate is structured in accordance with a pattern contained on the mask.
 81. The method according to claim 80, further comprising developing the photosensitive layer subsequent to said exposing, for structuring the substrate in accordance with the pattern contained on the mask.
 82. A method for the production of microstructured components, comprising: providing a substrate with a photosensitive layer; and exposing the substrate with ultraviolet light utilizing a mask and a projection exposure device having a refractive projection objective according to claim 7, whereby the substrate is structured in accordance with a pattern contained on the mask.
 83. The method according to claim 82, further comprising developing the photosensitive layer subsequent to said exposing, for structuring the substrate in accordance with the pattern contained on the mask.
 84. A method for the production of microstructured components, comprising: providing a substrate with a photosensitive layer; and exposing the substrate with ultraviolet light utilizing a mask and a projection exposure device having a projection objective according to claim 26, whereby the substrate is structured in accordance with a pattern contained on the mask.
 85. The method according to claim 84, further comprising developing the photosensitive layer subsequent to said exposing, for structuring the substrate in accordance with the pattern contained on the mask.
 86. A method for the production of microstructured components, comprising: providing a substrate with a photosensitive layer; and exposing the substrate with ultraviolet light utilizing a mask and a projection exposure device having a refractive projection objective according to claim 50, whereby the substrate is structured in accordance with a pattern contained on the mask.
 87. The method according to claim 86, further comprising developing the photosensitive layer subsequent to said exposing, for structuring the substrate in accordance with the pattern contained on the mask.
 88. A method for the production of microstructured components, comprising: providing a substrate with a photosensitive layer; and exposing the substrate with ultraviolet light utilizing a mask and a projection exposure device having a refractive projection objective according to claim 53, whereby the substrate is structured in accordance with a pattern contained on the mask.
 89. The method according to claim 88, further comprising developing the photosensitive layer subsequent to said exposing, for structuring the substrate in accordance with the pattern contained on the mask.
 90. A method for the production of microstructured components, comprising: providing a substrate with a photosensitive layer; and exposing the substrate with ultraviolet light utilizing a mask and a projection exposure device having a refractive projection objective according to claim 63, whereby the substrate is structured in accordance with a pattern contained on the mask.
 91. The method according to claim 90, further comprising developing the photosensitive layer subsequent to said exposing, for structuring the substrate in accordance with the pattern contained on the mask.
 92. A method for the production of microstructured components, comprising: providing a substrate with a photosensitive layer; and exposing the substrate with ultraviolet light utilizing a mask and a projection exposure device having a refractive projection objective according to claim 67, whereby the substrate is structured in accordance with a pattern contained on the mask.
 93. The method according to claim 92, further comprising developing the photosensitive layer subsequent to said exposing, for structuring the substrate in accordance with the pattern contained on the mask.
 94. A method for the production of microstructured components, comprising: providing a substrate with a photosensitive layer; and exposing the substrate with ultraviolet light utilizing a mask and a projection exposure device having a refractive projection objective according to claim 71, whereby the substrate is structured in accordance with a pattern contained on the mask.
 95. The method according to claim 94, further comprising developing the photosensitive layer subsequent to said exposing, for structuring the substrate in accordance with the pattern contained on the mask. 